March : Modelos de Limpieza por Plasma Modelo PX Series: The microprocessor provides automatic operation, is user friendly, and ensures precise, reproducible process conditions. Cycle duration is controlled by elapsed time and can be downloaded to a PC for further analysis. Power and Matching Network
The March CS 1701 Reactive Ion Etching system delivers performance often associated with high- investment etching tools. The system is excellent for metal etching, silicide etching and etching of III-V compounds, anisotropic etching of nitrides, oxides and polyimides. Key performance features of the CS 1701 system include the large DC bias and the ability to control process pressure independent of gas flow. The system allows users a wide variety of etch profiles ranging from anisotropic requiring high aspect ratios to sloped walls. |
Test Funcional RF AURIGA : Test Funcional RF De Auriga Measurement Systems ofrecemos equipos de test automa [ ... ] |
Limpieza Plasma Prototipos March : Limpieza por Plasma El equipo de limpieza de Plasma elimina de forma automática y [ ... ] |
Linea de prototipos Microelectronica Equipos para lineas de prototipos, investigación y desarrollo: Limpieza por Plasma >> [ ... ] |
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