March : Modelos de Limpieza por Plasma Modelo PX Series: The microprocessor provides automatic operation, is user friendly, and ensures precise, reproducible process conditions. Cycle duration is controlled by elapsed time and can be downloaded to a PC for further analysis. Power and Matching Network
The March CS 1701 Reactive Ion Etching system delivers performance often associated with high- investment etching tools. The system is excellent for metal etching, silicide etching and etching of III-V compounds, anisotropic etching of nitrides, oxides and polyimides. Key performance features of the CS 1701 system include the large DC bias and the ability to control process pressure independent of gas flow. The system allows users a wide variety of etch profiles ranging from anisotropic requiring high aspect ratios to sloped walls. |
Horno Vacio Prototipos
SST International : Modelos Horno con vacio
SST 1200 (Horno con vacio de sobremesa) |
Optical Leak Testing NORCOM : Optical Leack Testing Estamos trabajando en este contenido, disculpen las molest [ ... ] |
Die attach, flip chip, dispensing producción DATACON : Die attach, flip chip & dispensing Datacon se centra en el mercado del packaging [ ... ] |
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