Modelo PX Series:

The PX-Series control module monitors and controls the vacuum and gas flow, chamber pressure, and power level. Up to four mass controllers are connected to a gas-mixing manifold to provide process recipe flexibility.

The microprocessor provides automatic operation, is user friendly, and ensures precise, reproducible process conditions. Cycle duration is controlled by elapsed time and can be downloaded to a PC for further analysis.

Power and Matching Network
Different applications require different configurations and power densities. The PX-Series system is equipped with an automatic impedance matching network for ease of operation and consistent results. RF power supplies are available in either 300 or 600 watts depending on application requirements.




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Modelo CS1701 Anisotropic RIE plasma system:

The March CS 1701 Reactive Ion Etching system delivers performance often associated with high- investment etching tools. The system is excellent for metal etching, silicide etching and etching of III-V compounds, anisotropic etching of nitrides, oxides and polyimides.

Key performance features of the CS 1701 system include the large DC bias and the ability to control process pressure independent of gas flow. The system allows users a wide variety of etch profiles ranging from anisotropic requiring high aspect ratios to sloped walls.



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